English

• 
  
• 1. [1]

     Ji S., Wan L., Liu C. C., Nealey P. F.. Directed self-assembly of block copolymers on chemical patterns:a platform for nanofabrication[J]. Prog. Polym. Sci., 2016, 54-55:  76-127. doi: 10.1016/j.progpolymsci.2015.10.006

  2. [2]

     Li W., Mueller M.. Directed self-assembly of block copolymers by chemical or topographical guiding patterns:optimizing molecular architecture, thin-film properties, and kinetics[J]. Prog. Polym. Sci., 2016, 54-55:  47-75. doi: 10.1016/j.progpolymsci.2015.10.008

  3. [3]

     Delgadillo P. A. R., Gronheid R., Thode C. J., Wu H., Cao Y., Neisser M., Somervell M., Nafus K., Nealey P. F.. Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment[J]. J. Micro-nanolitho. Mems. Moems., 2012, 11(3):  031302. doi: 10.1117/1.JMM.11.3.031302

  4. [4]

     Mojarad N., Gobrecht J., Ekinci Y.. Interference lithography at euv and soft X-ray wavelengths:principles, methods, and applications[J]. Microelectron. Eng., 2015, 143:  55-63. doi: 10.1016/j.mee.2015.03.047

  5. [5]

     Ji S., Liu C. C., Liu G., Nealey P. F.. Molecular transfer printing using block copolymers[J]. ACS Nano, 2010, 4(2):  599-609. doi: 10.1021/nn901342j

  6. [6]

     Ji S., Liu C. C., Liao W., Fenske A. L., Craig G. S. W., Nealey P. F.. Domain orientation and grain coarsening in cylinder-forming poly(styrene-b-methyl methacrylate) films[J]. Macromolecules, 2011, 44(11):  4291-4300. doi: 10.1021/ma2005734

  7. [7]

     Ji S., Nagpal U., Liao W., Liu C. C., de Pablo J. J., Nealey P. F.. Three-dimensional directed assembly of block copolymers together with two-dimensional square and rectangular nanolithography[J]. Adv. Mater., 2011, 23(32):  3692-3697. doi: 10.1002/adma.v23.32

  8. [8]

     Jin X., Zhang X., Wan L., Nealey P. F., Ji S.. Fabrication of chemical patterns from graphoepitaxially assembled block copolymer films by molecular transfer printing[J]. Polymer, 2014, 55(15):  3278-3283. doi: 10.1016/j.polymer.2014.05.040

  9. [9]

     Liu G., Nealey P. F.. Improved block copolymer domain dispersity on chemical patterns via homopolymer-blending and molecular transfer printing[J]. Polymer, 2017, 116:  99-104. doi: 10.1016/j.polymer.2017.03.049

  10. [10]

      Onses M. S., Thode C. J., Liu C. C., Ji S., Cook P. L., Himpsel F. J., Nealey P. F.. Site-specific placement of au nanoparticles on chemical nanopatterns prepared by molecular transfer printing using block-copolymer films[J]. Adv. Funct. Mater., 2011, 21(16):  3074-3082. doi: 10.1002/adfm.201100300

  11. [11]

      Thode C. J., Cook P. L., Jiang Y., Serdar Onses M., Ji S., Himpsel F. J., Nealey P. F.. In situ metallization of patterned polymer brushes created by molecular transfer print and fill[J]. Nanotechnology, 2013, 24(15):  155602. doi: 10.1088/0957-4484/24/15/155602

  12. [12]

      Onses M. S.. Fabrication of nanopatterned poly(ethylene glycol) brushes by molecular transfer printing from poly(styreneblock-methyl methacrylate) films to generate arrays of Au nanoparticles[J]. Langmuir, 2015, 31(3):  1225-1230. doi: 10.1021/la504359f

  13. [13]

      Inoue T., Janes D. W., Ren J., Suh H. S., Chen X., Ellison C. J., Nealey P. F.. Molecular transfer printing of block copolymer patterns over large areas with conformal layers[J]. Adv. Mater. Interfaces, 2015, 2(10):  1500133. doi: 10.1002/admi.201500133

  14. [14]

      Solak H. H., David C., Gobrecht J., Golovkina V., Cerrina F., Kim S. O., Nealey P. F.. Sub-50 nm period patterns with EUV interference lithography[J]. Microelectron. Eng., 2003, 67-68:  56-62. doi: 10.1016/S0167-9317(03)00059-5

  15. [15]

      Wang J., Song J. H., Lu Y. Y., Ruan Y. J., An L. J.. Phase behavior and interfacial properties of diblock copolymer-homopolymer ternary mixtures:influence of volume fraction of copolymers and interaction energy[J]. Chinese J. Polym. Sci., 2017, 35(7):  874-886. doi: 10.1007/s10118-017-1915-8

  16. [16]

      Wei X. Y., Gu W. Y., Shen X. B., Strzalka J., Jiang Z., Russell T. P.. Deviations from bulk morphologies in thin films of block copolymer/additive binary blends[J]. Chinese J. Polym. Sci., 2013, 31(9):  1250-1259. doi: 10.1007/s10118-013-1320-x

  17. [17]

      Jin X. S., Pang Y. Y., Ji S. X.. From self-assembled monolayers to chemically patterned brushes:controlling the orientation of block copolymer domains in films by substrate modification[J]. Chinese J. Polym. Sci., 2016, 34(6):  659-678. doi: 10.1007/s10118-016-1800-x

  18. [18]

      Han E., In I., Park S. M., La Y. H., Wang Y., Nealey P. F., Gopalan P.. Photopatternable imaging layers for controlling block copolymer microdomain orientation[J]. Adv. Mater., 2007, 19(24):  4448-4452. doi: 10.1002/(ISSN)1521-4095

  19. [19]

      In I., La Y. H., Park S. M., Nealey P. F., Gopalan P.. Side-chain-grafted random copolymer brushes as neutral surfaces for controlling the orientation of block copolymer microdomains in thin films[J]. Langmuir, 2006, 22(18):  7855-7860. doi: 10.1021/la060748g

  20. [20]

      Ji S., Liao W., Nealey P. F.. Block cooligomers:a generalized approach to controlling the wetting behavior of block copolymer thin films[J]. Macromolecules, 2010, 43(16):  6919-6922. doi: 10.1021/ma1007946

  21. [21]

      Ji S., Liu C. C., Son J. G., Gotrik K., Craig G. S. W., Gopalan P., Himpsel F. J., Char K., Nealey P. F.. Generalization of the use of random copolymers to control the wetting behavior of block copolymer films[J]. Macromolecules, 2008, 41(23):  9098-9103. doi: 10.1021/ma801861h

  22. [22]

      Ji S., Liu G., Zheng F., Craig G. S. W., Himpsel F. J., Nealey P. F.. Preparation of neutral wetting brushes for block copolymer films from homopolymer blends[J]. Adv. Mater., 2008, 20(16):  3054-3060. doi: 10.1002/adma.v20:16

  23. [23]

      Mansky P., Liu Y., Huang E., Russell T. P., Hawker C. J.. Controlling polymer-surface interactions with random copolymer brushes[J]. Science, 1997, 275(5305):  1458-1460. doi: 10.1126/science.275.5305.1458

  24. [24]

      Pang Y., Wan L., Huang G., Zhang X., Jin X., Xu P., Liu Y., Han M., Wu G. P., Ji S.. Controlling block copolymersubstrate interactions by homopolymer brushes/mats[J]. Macromolecules, 2017, 50(17):  6733-6741. doi: 10.1021/acs.macromol.7b00743

  25. [25]

      Ryu D. Y., Shin K., Drockenmuller E., Hawker C. J., Russell T. P.. A generalized approach to the modification of solid surfaces[J]. Science, 2005, 308(5719):  236-239. doi: 10.1126/science.1106604

  26. [26]

      Liu G., Stoykovich M. P., Ji S., Stuen K. O., Craig G. S. W., Nealey P. F.. Phase behavior and dimensional scaling of symmetric block copolymer-homopolymer ternary blends in thin films[J]. Macromolecules, 2009, 42(8):  3063-3072. doi: 10.1021/ma802773h

  27. [27]

      Kim S. O., Solak H. H., Stoykovich M. P., Ferrier N. J., de Pablo J. J., Nealey P. F.. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates[J]. Nature, 2003, 424(6947):  411-414. doi: 10.1038/nature01775

  28. [28]

      Stoykovich M. P., Muller M., Kim S. O., Solak H. H., Edwards E. W., de Pablo J. J., Nealey P. F.. Directed assembly of block copolymer blends into nonregular device-oriented structures[J]. Science, 2005, 308(5727):  1442-1446. doi: 10.1126/science.1111041

  29. [29]

      Cheng J. Y., Rettner C. T., Sanders D. P., Kim H. C., Hinsberg W. D.. Dense self-assembly on sparse chemical patterns:rectifying and multiplying lithographic patterns using block copolymers[J]. Adv. Mater., 2008, 20(16):  3155-3158. doi: 10.1002/adma.v20:16

  30. [30]

      Ruiz R., Kang H., Detcheverry F. A., Dobisz E., Kercher D. S., Albrecht T. R., de Pablo J. J., Nealey P. F.. Density multiplication and improved lithography by directed block copolymer assembly[J]. Science, 2008, 321(5891):  936-939. doi: 10.1126/science.1157626

  31. [31]

      Liu G., Thomas C. S., Craig G. S. W., Nealey P. F.. Integration of density multiplication in the formation of device-oriented structures by directed assembly of block copolymer-homopolymer blends[J]. Adv. Funct. Mater., 2010, 20(8):  1251-1257. doi: 10.1002/adfm.v20:8

  32. [32]

      Liu C. C., Ramirez-Hernandez A., Han E., Craig G. S. W., Tada Y., Yoshida H., Kang H., Ji S., Gopalan P., de Pablo J. J., Nealey P. F.. Chemical patterns for directed self-assembly of lamellae-forming block copolymers with density multiplication of features[J]. Macromolecules, 2013, 46(4):  1415-1424. doi: 10.1021/ma302464n

  33. [33]

      Stoykovich M., Edwards E., Solak H., Nealey P.. Phase behavior of symmetric ternary block copolymer-homopolymer blends in thin films and on chemically patterned surfaces[J]. Phys. Rev. Lett., 2006, 97(14):  147802. doi: 10.1103/PhysRevLett.97.147802

  34. [34]

      Edwards E. W., Montague M. F., Solak H. H., Hawker C. J., Nealey P. F.. Precise control over molecular dimensions of block-copolymer domains using the interfacial energy of chemically nanopatterned substrates[J]. Adv. Mater., 2004, 16(15):  1315-1319. doi: 10.1002/(ISSN)1521-4095

  35. [35]

      Edwards E. W., Mueller M., Stoykovich M. P., Solak H. H., de Pablo J. J., Nealey P. F.. Dimensions and shapes of block copolymer domains assembled on lithographically defined chemically patterned substrates[J]. Macromolecules, 2007, 40(1):  90-96. doi: 10.1021/ma0607564

  36. [36]

      Green P. F., Kramer E. J.. Temperature dependence of tracer diffusion coefficients in polystyrene[J]. J. Mater. Res., 1986, 1(1):  202-204. doi: 10.1557/JMR.1986.0202

  37. [37]

      Welander A. M., Kang H., Stuen K. O., Solak H. H., Mueller M., de Pablo J. J., Nealey P. F.. Rapid directed assembly of block copolymer films at elevated temperatures[J]. Macromolecules, 2008, 41(8):  2759-2761. doi: 10.1021/ma800056s

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