引用本文:
Lan HUANG, Li Na XU, Hao Ying SHEN, Hai Qian ZHANG, Ning GU. Micro-patterning of Copper Based on Photolithographed Self-assembly Monolayers[J]. Chinese Chemical Letters,
2002, 13(2): 163-164.
Citation: Lan HUANG, Li Na XU, Hao Ying SHEN, Hai Qian ZHANG, Ning GU. Micro-patterning of Copper Based on Photolithographed Self-assembly Monolayers[J]. Chinese Chemical Letters, 2002, 13(2): 163-164.
Citation: Lan HUANG, Li Na XU, Hao Ying SHEN, Hai Qian ZHANG, Ning GU. Micro-patterning of Copper Based on Photolithographed Self-assembly Monolayers[J]. Chinese Chemical Letters, 2002, 13(2): 163-164.
Micro-patterning of Copper Based on Photolithographed Self-assembly Monolayers
摘要:
A new method has been developed for fabrication of copper micro-pattern by selective chemical copper deposition based on photolithographed (3-mercaptopropyl)-trimethoxysilane (MPTS) self-assembly monolayers (SAMs).As confirmed by scanning electron microscopy (SEM), Cu closely replicated the mask features.The present approach makes this technic to be cheap and may be applicable to assembly of microelectronic circuits.
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关键词:
- Micro-pattern
- / deposition
- / photolithograph
- / SAMs
- / MPTS
- / SEM
English
Micro-patterning of Copper Based on Photolithographed Self-assembly Monolayers
Abstract:
A new method has been developed for fabrication of copper micro-pattern by selective chemical copper deposition based on photolithographed (3-mercaptopropyl)-trimethoxysilane (MPTS) self-assembly monolayers (SAMs).As confirmed by scanning electron microscopy (SEM), Cu closely replicated the mask features.The present approach makes this technic to be cheap and may be applicable to assembly of microelectronic circuits.
-
Key words:
- Micro-pattern
- / deposition
- / photolithograph
- / SAMs
- / MPTS
- / SEM
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