Ni-CONTAINING CARBON FILMS PREPARED BY RF GLOW DISCHARGE DEPOSITION

Wei Min CAO Kun Lin ZHOU Rui Hua ZHOU

引用本文: Wei Min CAO,  Kun Lin ZHOU,  Rui Hua ZHOU. Ni-CONTAINING CARBON FILMS PREPARED BY RF GLOW DISCHARGE DEPOSITION[J]. Chinese Chemical Letters, 1994, 5(7): 631-634. shu
Citation:  Wei Min CAO,  Kun Lin ZHOU,  Rui Hua ZHOU. Ni-CONTAINING CARBON FILMS PREPARED BY RF GLOW DISCHARGE DEPOSITION[J]. Chinese Chemical Letters, 1994, 5(7): 631-634. shu

Ni-CONTAINING CARBON FILMS PREPARED BY RF GLOW DISCHARGE DEPOSITION

摘要: Ni-containing carbon films were prepared by rf glow discharge decomposition of methane and nickel carbonyl.The deposited films contained C,Ni,H,O and small amounts of N.Nickel existed in forms of metallic Ni and Ni2O3.The oxidation of nickel mainly occurred on film surface.With lower Ni contents,the film maintained the structure of DLC film-With the increase of Ni content,the films showed some crystalline features of Ni and Ni2O3.

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  • 收稿日期:  1994-02-28
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