引用本文:
王宇, 何凤荣, 刘冠昆, 童叶翔. 二甲基甲酰胺中电沉积制备钐钴合金[J]. 应用化学,
2002, 19(1): 88-90.
Citation: WANG Yu, HE Feng-Rong, LIU Guan-Kun, TONG Ye-Xiang. Preparation of Sm-Co Alloy by Electrodeposition in DMF Solution[J]. Chinese Journal of Applied Chemistry, 2002, 19(1): 88-90.
Citation: WANG Yu, HE Feng-Rong, LIU Guan-Kun, TONG Ye-Xiang. Preparation of Sm-Co Alloy by Electrodeposition in DMF Solution[J]. Chinese Journal of Applied Chemistry, 2002, 19(1): 88-90.
二甲基甲酰胺中电沉积制备钐钴合金
English
Preparation of Sm-Co Alloy by Electrodeposition in DMF Solution
Abstract:
Electrodeposition of Sm-Co alloy in DMF solution was studied by cyclic voltammetry and potentiostatic deposition at room temperature. The results show that small amount of water in a solution of Sm(NO3)3+CoCl2+DMF blocked the electrodeposition of Sm-Co due to the formation of nonconductive Sm(OH)3 film on the cathode surface. Citric acid could buffer the pH change and inhibit the precipitation of Sm(OH)3 on the cathode surface which makes the co-deposition of Sm and Co easy. Potentiostatic deposition was carried out on copper electrode in Sm(NO3)3+CoCl2+Citric acid+DMF solution and Sm-Co alloy films were obtained where the content of Sm could be as high as 57 56%.
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Key words:
- Sm-Co alloy
- / potentiostatic deposition
- / citric acid
- / dimethylformamide
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