引用本文:
任海兰, 刘韩星, 张汉林, 欧阳世翕, 王典芬. Cr,Fe,Cu/Al2O3界面化学结构的光电子能谱[J]. 物理化学学报,
1996, 12(10): 900-904.
doi:
10.3866/PKU.WHXB19961008
Citation: Ren Hai-Lan, Liu Han-Xing, Zhang Han-Lin, Ouyang Shi-Xi, Wang Dian-fEn. The Chemical Structure of Cr,Fe,Cu/Al2O3 Interface by XPS[J]. Acta Physico-Chimica Sinica, 1996, 12(10): 900-904. doi: 10.3866/PKU.WHXB19961008
Citation: Ren Hai-Lan, Liu Han-Xing, Zhang Han-Lin, Ouyang Shi-Xi, Wang Dian-fEn. The Chemical Structure of Cr,Fe,Cu/Al2O3 Interface by XPS[J]. Acta Physico-Chimica Sinica, 1996, 12(10): 900-904. doi: 10.3866/PKU.WHXB19961008
Cr,Fe,Cu/Al2O3界面化学结构的光电子能谱
English
The Chemical Structure of Cr,Fe,Cu/Al2O3 Interface by XPS
Abstract:
The chemical states of metal-ceramic interface were studied by XPS accompany the ion etching in situ. The results showed that Cr and Fe were both oxidized at the interfaces, and the degree of the oxidization was Cr>Fe, while Cu was not oxidized. The quantity analysis showed that the thickness of the interfaces had a direct relations with the chemical reaction.
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Key words:
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Metal-ceramic interface
- / XPS
- / Chemical structure
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