Citation: Zhu Yong-Fa, Ye Xiao-Yan, Yao Wen-Qing, Chen De-Pu, Cao Li-Li. The Stability of C60 Film Bombarded by Ar Ion Beam[J]. Acta Physico-Chimica Sinica, 1995, 11(08): 699-703. doi: 10.3866/PKU.WHXB19950806
Ar离子束作用下C60薄膜的结构稳定性研究
English
The Stability of C60 Film Bombarded by Ar Ion Beam
In this paper, the C60 film was deposited by vacuum evaporation at 450℃.The Stability of C60 film bombarded by Ar ion beam has been studied using XPS and AES. The results have shown that the film deposited by vacuum evaporation was very pure. It did not contain any oxygen inside C60 film. The shake-up peaks of C1s and valence band peaks were the character peaks of C60 melecule. After C60 film had been bombarded by Ar ion beam, the binding energy of C1s decreased from 284.7 eV to 284.4 eV, the kinetic energy of CKLL increased from 270.0eV to 271.3eV. The character peaks (C1s shake-up peaks and valence band peaks) disappeared after bombarded by Ar ion beam. The nature of action between C60 film and Ar ion beam was the decomposition of C60 molecule and the formation of pure carbon. Increasing the radiation time and energy of ion beam can increase the decomposition of C60 molecule.
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Key words:
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C60
- / Fullerene film
- / Ion beam
- / Stability
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