The effects of ultrasound frequency and power on the activation energy in Si-KOH reaction system
English
The effects of ultrasound frequency and power on the activation energy in Si-KOH reaction system
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Key words:
- Si-KOH
- / Etching rate
- / Ultrasonic irradiation
- / Activation energy
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[1] C.S. Zhou, H. Ma, Ultrasonic degradation of polysaccharide from a red algae (Porphyra yezoensis), J. Agric. Food Chem. 54 (2006) 2223-2228.[1] C.S. Zhou, H. Ma, Ultrasonic degradation of polysaccharide from a red algae (Porphyra yezoensis), J. Agric. Food Chem. 54 (2006) 2223-2228.
-
[2] H.M. Moghaddam, S. Nasirian, Decreasing of the activation energy of TiO2 nanoparticles by applying ultrasound waves using the sol-gel method, Iran. J. Phys. Res. 11 (2012) 411-416.[2] H.M. Moghaddam, S. Nasirian, Decreasing of the activation energy of TiO2 nanoparticles by applying ultrasound waves using the sol-gel method, Iran. J. Phys. Res. 11 (2012) 411-416.
-
[3] S.U. Rege, R.T. Yang, C.A. Cain, Desorption by ultrasound: phenol on activated carbon and polymeric resin, AIChE J. 44 (1998) 1519-1528.[3] S.U. Rege, R.T. Yang, C.A. Cain, Desorption by ultrasound: phenol on activated carbon and polymeric resin, AIChE J. 44 (1998) 1519-1528.
-
[4] E.X. Leaes, D. Lima, L. Miklasevicius, et al., Effect of ultrasound-assisted irradiation on the activities of a-amylase and amyloglucosidase, Biocatal. Agric. Biotechnol. 2 (2013) 21-25.[4] E.X. Leaes, D. Lima, L. Miklasevicius, et al., Effect of ultrasound-assisted irradiation on the activities of a-amylase and amyloglucosidase, Biocatal. Agric. Biotechnol. 2 (2013) 21-25.
-
[5] M. Souza, E.T. Mezadri, E. Zimmerman, et al., Evaluation of activity of a commercial amylase under ultrasound-assisted, Ultrason. Sonochem. 20 (2013) 89-94.[5] M. Souza, E.T. Mezadri, E. Zimmerman, et al., Evaluation of activity of a commercial amylase under ultrasound-assisted, Ultrason. Sonochem. 20 (2013) 89-94.
-
[6] M.A. Behnajady, N. Modirshahla, M. Shokri, B. Vahid, Investigation of the effect of ultrasonic waves on the enhancement of efficiency of direct photolysis and photooxidation processes on the removal of a model contaminant from textile industry, Global NEST J. 10 (2008) 8-15.[6] M.A. Behnajady, N. Modirshahla, M. Shokri, B. Vahid, Investigation of the effect of ultrasonic waves on the enhancement of efficiency of direct photolysis and photooxidation processes on the removal of a model contaminant from textile industry, Global NEST J. 10 (2008) 8-15.
-
[7] M.R. Wang, L. Jiang, S.F. Zhou, Z.Y. Zhang, Z.C. Ji, Ultrasound-assisted synthesis and preliminary bioactivity of novel 2H-1,2,4-thiadiazolo [2,3] pyrimidine derivatives containing fluorine, Chin. Chem. Lett. 23 (2012) 561-564.[7] M.R. Wang, L. Jiang, S.F. Zhou, Z.Y. Zhang, Z.C. Ji, Ultrasound-assisted synthesis and preliminary bioactivity of novel 2H-1,2,4-thiadiazolo [2,3] pyrimidine derivatives containing fluorine, Chin. Chem. Lett. 23 (2012) 561-564.
-
[8] M.R.P. Heravi, An efficient fluorination of b-ketosulfones promoted by a room temperature ionic liquid at ambient conditions under ultrasound irradiation using SelectfluorTM F-TEDA-BF4, Chin. Chem. Lett. 21 (2010) 1399-1402.[8] M.R.P. Heravi, An efficient fluorination of b-ketosulfones promoted by a room temperature ionic liquid at ambient conditions under ultrasound irradiation using SelectfluorTM F-TEDA-BF4, Chin. Chem. Lett. 21 (2010) 1399-1402.
-
[9] C.L. Pieck, R.J. Verderone, E.L. Jablonski, J.M. Parena, Burning of coke on Pt Re/Al2O3 catalyst: activation energy and oxygen reaction order, Appl. Catal. 55 (1989) 1-10.[9] C.L. Pieck, R.J. Verderone, E.L. Jablonski, J.M. Parena, Burning of coke on Pt Re/Al2O3 catalyst: activation energy and oxygen reaction order, Appl. Catal. 55 (1989) 1-10.
-
[10] W.T. Tsang, S. Wang, Preferentially etched diffraction gratings in silicon, J. Appl. Phys. 46 (1975) 2163-2166.[10] W.T. Tsang, S. Wang, Preferentially etched diffraction gratings in silicon, J. Appl. Phys. 46 (1975) 2163-2166.
-
[11] J. Sarathy, D.C. Diaz, J.C. Campbell, Crystallographically limited submicrometer gratings in (1 0 0) and (2 1 1) silicon, Opt. Lett. 20 (1995) 1216-1218.[11] J. Sarathy, D.C. Diaz, J.C. Campbell, Crystallographically limited submicrometer gratings in (1 0 0) and (2 1 1) silicon, Opt. Lett. 20 (1995) 1216-1218.
-
[12] C.H. Chang, R.K. Heilmann, R.C. Fleming, et al., Fabrication of sawtooth diffraction gratings using nanoimprint lithography, J. Vac. Sci. Technol. 21 (2003) 2755- 2759.[12] C.H. Chang, R.K. Heilmann, R.C. Fleming, et al., Fabrication of sawtooth diffraction gratings using nanoimprint lithography, J. Vac. Sci. Technol. 21 (2003) 2755- 2759.
-
[13] M.P. Kowalski, R.K. Heilmann, M.L. Schattenburg, et al., Near-normal-incidence extreme-ultraviolet efficiency of a flat crystalline anisotropically etched blazed grating, Appl. Opt. 45 (2006) 1676-1679.[13] M.P. Kowalski, R.K. Heilmann, M.L. Schattenburg, et al., Near-normal-incidence extreme-ultraviolet efficiency of a flat crystalline anisotropically etched blazed grating, Appl. Opt. 45 (2006) 1676-1679.
-
[14] U.U. Graf, D.T. Jaffe, E.J. Kim, et al., Fabrication and evaluation of an etched infrared diffraction grating, Appl. Opt. 33 (1994) 96-102.[14] U.U. Graf, D.T. Jaffe, E.J. Kim, et al., Fabrication and evaluation of an etched infrared diffraction grating, Appl. Opt. 33 (1994) 96-102.
-
[15] L.D. Keller, D.T. Jaffe, O.A. Ershov, B. Thomas, U.U. Graf, Fabrication and testing of chemically micromachined silicon echelle gratings, Appl. Opt. 39 (2000) 1094- 1105.[15] L.D. Keller, D.T. Jaffe, O.A. Ershov, B. Thomas, U.U. Graf, Fabrication and testing of chemically micromachined silicon echelle gratings, Appl. Opt. 39 (2000) 1094- 1105.
-
[16] J.P. Marsh, D.J. Mar, D.T. Jaffe, Production and evaluation of silicon immersion gratings for infrared astronomy, Appl. Opt. 46 (2007) 3400-3416.[16] J.P. Marsh, D.J. Mar, D.T. Jaffe, Production and evaluation of silicon immersion gratings for infrared astronomy, Appl. Opt. 46 (2007) 3400-3416.
-
[17] H. Seidel, L. Csepregi, A. Heuberger, H. Baumgartel, Anisotropic etching of crystalline silicon in alkaline solutions. I. Orientation dependence and behavior of passivation layers, J. Electrochem. Soc. 137 (1990) 3612-3626.[17] H. Seidel, L. Csepregi, A. Heuberger, H. Baumgartel, Anisotropic etching of crystalline silicon in alkaline solutions. I. Orientation dependence and behavior of passivation layers, J. Electrochem. Soc. 137 (1990) 3612-3626.
-
[18] E. Herr, H. Baltes, KOH etching of high-index crystal planes in silicon, Sens. Actuators A: Phys. 31 (1992) 283-287.[18] E. Herr, H. Baltes, KOH etching of high-index crystal planes in silicon, Sens. Actuators A: Phys. 31 (1992) 283-287.
-
[19] P.M. Zavrocky, T. Earles, N.L. Pokrovskiy, J.A. Green, B.E. Burns, Fabrication of vertical sidewalls by anisotropic etching of silicon (1 0 0) wafers, J. Electrochem. Soc. 141 (1994) 3182-3188.[19] P.M. Zavrocky, T. Earles, N.L. Pokrovskiy, J.A. Green, B.E. Burns, Fabrication of vertical sidewalls by anisotropic etching of silicon (1 0 0) wafers, J. Electrochem. Soc. 141 (1994) 3182-3188.
-
[20] J.B. Price, Anisotropic etching of silicon with KOH-H2O-isopropyl alcohol, in: H.R. Huff, R.R. Burgess (Eds.), Semiconductor Silicon, Electrochemical Society, Pennington, 1973, p. 339.[20] J.B. Price, Anisotropic etching of silicon with KOH-H2O-isopropyl alcohol, in: H.R. Huff, R.R. Burgess (Eds.), Semiconductor Silicon, Electrochemical Society, Pennington, 1973, p. 339.
-
[21] K. Ohwada, Y. Negoro, Y. Konaka, T. Oguchi, Groove depth uniformization in[1 1 0] Si anisotropic etching by ultrasonic wave and application to accelerometer fabrication, in: Proceedings of the IEEE Micro Electro Mechanical Systems, Amsterdam, Netherlands, IEEE, 1995, pp. 100-105.[21] K. Ohwada, Y. Negoro, Y. Konaka, T. Oguchi, Groove depth uniformization in[1 1 0] Si anisotropic etching by ultrasonic wave and application to accelerometer fabrication, in: Proceedings of the IEEE Micro Electro Mechanical Systems, Amsterdam, Netherlands, IEEE, 1995, pp. 100-105.
-
[22] T. Baum, D.J. Schiffrin, AFM study of surface finish improvement by ultrasound in the anisotropic etching of Si(1 0 0) in KOH for micromachining application, J. Micromech. Microeng. 7 (1997) 338-342.[22] T. Baum, D.J. Schiffrin, AFM study of surface finish improvement by ultrasound in the anisotropic etching of Si(1 0 0) in KOH for micromachining application, J. Micromech. Microeng. 7 (1997) 338-342.
-
[23] J. Chen, L.T. Lin, Z.J. Li, et al., Study of anisotropic etching of (1 0 0) Si with ultrasonic agitation, Sens. Actuators A 96 (2002) 152-156.[23] J. Chen, L.T. Lin, Z.J. Li, et al., Study of anisotropic etching of (1 0 0) Si with ultrasonic agitation, Sens. Actuators A 96 (2002) 152-156.
-
[24] C.R. Yang, P.Y. Chen, Y.C. Chion, R.T. Lee, Effects of mechanical agitation and surfactant additive on silicon anisotropic etching in alkaline KOH solution, Sens. Actuators A 119 (2005) 263-270.[24] C.R. Yang, P.Y. Chen, Y.C. Chion, R.T. Lee, Effects of mechanical agitation and surfactant additive on silicon anisotropic etching in alkaline KOH solution, Sens. Actuators A 119 (2005) 263-270.
-
[25] Q.B. Jiao, Bayanheshig, X. Tan, J.W. Zhu, Numerical simulation of ultrasonic enhancement on mass transfer in liquid-solid reaction by a new computational model, Ultrason. Sonochem. 21 (2014) 535-541.[25] Q.B. Jiao, Bayanheshig, X. Tan, J.W. Zhu, Numerical simulation of ultrasonic enhancement on mass transfer in liquid-solid reaction by a new computational model, Ultrason. Sonochem. 21 (2014) 535-541.
-
[26] R.L. Bristol, J.A. Britten, R. Hemphill, P. Jelinsky, M. Hurwitz, Silicon diffraction gratings for use in the far and extreme-ultraviolet, Proc. SPIE 3114 (1997) 580- 585.[26] R.L. Bristol, J.A. Britten, R. Hemphill, P. Jelinsky, M. Hurwitz, Silicon diffraction gratings for use in the far and extreme-ultraviolet, Proc. SPIE 3114 (1997) 580- 585.
-
[27] J. Peng, C. Chao, J.Y. Dai, H.L.W. Chan, H.S. Luo, Micro-patterning of 0.70Pb (Mg1/3Nb2/3)O3-0.30PbTiO3 single crystals by ultrasonic wet chemical etching, Mater. Lett. 62 (2008) 3127-3130.[27] J. Peng, C. Chao, J.Y. Dai, H.L.W. Chan, H.S. Luo, Micro-patterning of 0.70Pb (Mg1/3Nb2/3)O3-0.30PbTiO3 single crystals by ultrasonic wet chemical etching, Mater. Lett. 62 (2008) 3127-3130.
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