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Citation: Li Aichang, Zhang Guoqing, Liu Bing. Structure and the Thermal Stability of Electrodeposited Ni-W-P Alloy-Films on Silicon[J]. Chinese Journal of Applied Chemistry, ;1998, 15(3): 35-38. shu

Structure and the Thermal Stability of Electrodeposited Ni-W-P Alloy-Films on Silicon

1.
Department of Chemistry, Langfang Teacher's College, Langfang 065000;
2.
Department of Applied Chemistry, Tianjin University, Tianjin

Received Date: 21 November 1997
Revised Date: 20 March 1998

It is found that the electroplating time affected the chemical composition of the electrodeposited Ni-W-P alloy films on p-silicon and their structures. The DTA results showed that the crystal structure of the amorphous Ni-W-P film does not change drastically at 200 ℃ to 500 ℃ under N₂. The Ni-W-P film has better thermal stability than that of amorphous Ni-P film.
- p-type silicon,
- electrodeposited Ni-W-P film,
- structure,
- thermal stability
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