Citation:
LIAO Ming-Jia, QIAO Lei, XIAO Peng, ZHANG Yun-Huai, CHEN Gang-Cai, ZHOU Zhi-En, HE Xiao-Lan, JIE Fang-Fang. Preparation of Silicon Nanowires Array by Wet Chemistry Methods and Photoelectrochemical Hydrogen Generation Performance Analysis[J]. Chinese Journal of Inorganic Chemistry,
;2015, (3): 439-445.
doi:
10.11862/CJIC.2015.043
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To explore the similarities and differences of hydrogen generation performance of silicon nanowires array (SiNWs array) photocathode prepared by different methods, we adopted two-step metal-catalyzed electroless etching method (TMCEE), one-step metal-catalyzed electroless etching method (OMCEE) and anodic oxidation etching method (AOE) to fabricate silicon nanowires array as a photocathode material for photoelectrochemical hydrogen generation. Comparing with morphology, crystalline, anti-reflection characterization by FESEM, XRD and UV-Vis-IR DRS means, SiNWs array by TMCEE maintained better crystal structure and less surface defects than the samples prepared by the other two methods. Photoelectrochemical tests showed that the performance of SiNWs array by TMCEE was optimal. The photocurrent density value of SiNWs array by TMCEE was 4 times than the one by OMCEE, and 40 times than the one by AOE. The charge transfer resistance of SiNWs array by TMCEE was only 1/3 of SiNWs array by OMCEE, and 1/1 000 of SiNWs array by AOE.
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