Citation: Cao Jinjun, Shan Yanguang. Simulation on Three Dimensional Nanoscale Thin-Film Deposition[J]. Chemistry, ;2018, 81(7): 641-645. shu

Simulation on Three Dimensional Nanoscale Thin-Film Deposition

  • Corresponding author: Shan Yanguang, shan@usst.edu.cn
  • Received Date: 3 March 2018
    Accepted Date: 26 April 2018

Figures(9)

  • The dual scale structure formed after the drying based on the three-dimensional kinetic Monte Carlo model. The effects of liquid chemical potential, nanoparticle migration rate, chemical potential sharpness and liquid critical evaporation rate on the structure of film are explored. The results indicate that, when the film is drying, the nanoparticles in the film move along with the three phase lines, and a variety of sedimentary structures are formed in the substrate. With the increase of the initialization chemical potential of the liquid, the deposition structure gradually becomes a dense network structure with uniform distribution. With the decrease of the critical evaporation rate of liquid, the deposition structure become more obvious after the liquid chemical potential is abrupt. The faster the nanoparticle moves, the less the branched structure in the deposition structure. The sharpness of chemical potential has a great influence on the difference of the structure of the double-scale sedimentary structure. With the greater the sharpness, the difference between the two kinds of sedimentary structures will be greater.
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