Citation: WU Xiao-Ying, YANG Li-Kun, YAN Hui, YANG Fang-Zu, TIAN Zhong-Qun, ZHOU Shao-Min. Electrochemical Nucleation of Au on n-Type Semiconductor Silicon Electrode Surface[J]. Acta Physico-Chimica Sinica, ;2015, 31(9): 1708-1714. doi: 10.3866/PKU.WHXB201507101 shu

Electrochemical Nucleation of Au on n-Type Semiconductor Silicon Electrode Surface

1.
State Key Laboratory of Physical Chemistry of Solid Surfaces, College of Chemistry and Chemical Engineering, Xiamen University, Xiamen 361005, Fujian Province, P. R. China

Received Date: 3 April 2015
Available Online: 10 July 2015
Fund Project: 国家重大科学仪器设备开发专项(2011YQ03012406) (2011YQ03012406) 国家自然科学基金界面电化学创新群体(21321062) (21321062)国家自然科学基金(21373172)资助项目 (21373172)

Cyclic voltammetry and chronoamperometry have been used to investigate the mechanism of ld electrodeposition on the n-Si(111) electrode surface from a citrate bath, which had successfully applied to directly electroplate a dense ld film on the silicon surface. The results show that Au electrodeposition on the n-type silicon surface is an irreversible process, and the nucleation overpotential reaches 250 mV. According to Cottrell equation, the diffusion coefficient (D) is calculated to be (1.81 ± 0.14) × 10^-4 cm₂·s^-1. The Scharifker-Hills (SH) model was used to analyze the experimental data. Agreement between the fitting curves and the theoretical curves confirms that the nucleation process of Au electrodeposition on the n-type silicon surface follows the progressive nucleation mechanism with three-dimensional growth under diffusion control. To further confirm the progressive nucleation mechanism, scanning electron microscopy (SEM) was used to observe the nucleation and growth of Au deposits at the initial stage of electrodeposition. The SEM results show that the morphology and density of the Au deposits are affected by the electrochemical deposition potential and time.
- n-Type silicon,
- Au,
- Cyclic voltammetry,
- Chronoamperometry,
- Nucleation mechanism
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沈阳化工大学材料科学与工程学院沈阳 110142