Citation: SHI Ji-Peng, YANG Fang-Zu, TIAN Zhong-Qun, ZHOU Shao-Min. Electrocrystallization of Cu-Sn Alloy on Copper Electrode Surface[J]. Acta Physico-Chimica Sinica, ;2013, 29(12): 2579-2584. doi: 10.3866/PKU.WHXB201310092
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The co-deposition and electrocrystallization of Cu-Sn alloy in a weak acidic citrate bath were studied by linear sweep voltammetry (LSV), cyclic voltammetry (CV), and chronoamperometry. The Scharifker- Hill (SH) theory model and Heerman-Tarallo (HT) theory model were applied to analyze the chronoamperometry data. The results show that the Cu-Sn alloy co-deposited on copper electrode, following instantaneous nucleation with three-dimensional (3D) growth under diffusion control. The kinetic parameters were obtained using the HT model. As the step potential shifted from -0.80 to -0.85 V, the nucleation rate constant (A) increased from 20.19 to 177.67 s-1, the density of active nucleation sites (N0) increased from 6.10×105 to 1.42×106 cm-2, and the diffusion coefficient (D) was (6.13±0.62)×10-6 cm2·s-1.
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