Citation: CHEN Peng, TAN Xin, YU Tao. Effects of Total Pressure and Ar/O₂ Flow Ratios on Photocatalytic Properties of TiO₂ Thin Films Deposited by Direct Current Facing-Target Magnetron Sputtering[J]. Acta Physico-Chimica Sinica doi: 10.3866/PKU.WHXB201207061 shu

Effects of Total Pressure and Ar/O₂ Flow Ratios on Photocatalytic Properties of TiO₂ Thin Films Deposited by Direct Current Facing-Target Magnetron Sputtering

CHEN Peng ^1,2 ,
TAN Xin ¹ ,
YU Tao ^3,

1.
1. School of Environmental Science and Engineering, Tianjin University, Tianjin 300072, P. R. China;
2. Institute of Seawater Desalination and Multipurpose Utilization, State Oceanic Administration, Tianjin 300192, P. R. China;
3. School of Chemical Engineering, Tianjin University, Tianjin 300072, P. R. China

Received Date: 30 March 2012
Available Online: 6 July 2012
Fund Project: 国家重点基础研究发展规划项目(973) (2012CB720100) (973) (2012CB720100)国家自然科学基金(20973124)资助 (20973124)

Polycrystalline TiO₂ thin films were prepared by direct current facing-target magnetron sputtering at different sputtering pressures and Ar/O₂ flow ratios. The average thickness of all prepared films was 200 nm, measured by surface roughness tester. With increase in sputtering pressure (p_tot), the prepared films changed from mixtures of anatase and rutile phases to pure anatase. The influences of different sputtering pressures and Ar/O₂ flow ratios on surface morphology of prepared films were investigated by field emission scanning electron microscopy (FESEM) and atomic force microscopy (AFM). The film surface was found to become rougher with increasing pressure and Ar/O₂ flow ratios. Photocatalytic activities of the prepared TiO₂ thin films were investigated by decomposition of iso-propanol (IPA) with initial concentration of 100×10^-6 (volume fraction) under UV irradiation. The IPA was oxidized to acetone and further to carbon dioxide. TiO₂ thin film deposited at 2.0 Pa with an Ar/O₂ flow ratio of 1:1 showed the highest photocatalytic activity and maintained a high stability constant during the reaction.
- TiO₂ thin film,
- Facing-target magnetron sputtering,
- Total pressure,
- Ar/O₂ flow ratio,
- iso-Propanol degradation,
- Superhydrophilicity
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Effects of Total Pressure and Ar/O2 Flow Ratios on Photocatalytic Properties of TiO2 Thin Films Deposited by Direct Current Facing-Target Magnetron Sputtering

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通讯作者: 陈斌, bchen63@163.com

Effects of Total Pressure and Ar/O₂ Flow Ratios on Photocatalytic Properties of TiO₂ Thin Films Deposited by Direct Current Facing-Target Magnetron Sputtering