Citation:
Wang Ze-Xin, Chen Shou-Gang, Qiao Qing-An, Zhang Wen-Xia. Adsorption Dynamics of Oxygen Atom and Hydroxyl Radical on Low Index Nickel Surfaces[J]. Acta Physico-Chimica Sinica,
;2001, 17(11): 1006-1012.
doi:
10.3866/PKU.WHXB20011110
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The interactional potential of O-Ni surface system was simulated by means of the 5-parameter.Morse potential,the adsorptive characteristics of an oxygen atom on low index nickel surface.An extended LEPS potential for the OH-Ni surface system was constructed.Data of adsorption sites,adsorption geometry,binding energy and eigenvibration etc.were obtained.These results show that high-symmetry sites are the most stable sites for OH perpendicular adsorption.Adsorption energies for OH perpendicular adsorption are 109.45 kJ•mol-1 at 4-fold hollow site on Ni (100),96.00 kJ•mol-1 at 3-fold hollow site on Ni (111).However,there are two adsorptive sites on Ni(110):one is the perpendicular adsorption at long-bridge site with adsorptive energy 99.38 kJ•mol-1 ;the other is a 14° inclined from the surface normal at phoney 3-fold site on Ni (110) with adsorptive energy 96.98 kJ•mol-1,the calculated results are in od agreement with the experimental ones.
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