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Citation: Chen Zhu-Cheng, Zheng Ji-Wen, Liu Zhong-Fan. Fabrication of Nanostructures on Si Surface Using ld Nanoparticle Mask[J]. Acta Physico-Chimica Sinica, ;2001, 17(10): 868-872. doi: 10.3866/PKU.WHXB20011002 shu

Fabrication of Nanostructures on Si Surface Using ld Nanoparticle Mask

1.
Center for Nanoscale Science ＆ Technology (CNST) and College of Chemistry and Molecular Engineering,Peking University,Beijing　100871

Received Date: 1 March 2001
Available Online: 15 October 2001

Using ld nanoparticle as nanooxidation mask,tapping mode atomic force microscope (TMAFM) nanolithography and wet chemical etching techniques were combined to build nanostructure on Si surface. The nanoparticles were immobilized on mercaptopropyltrimethoxysilane (MPTS)modified silicon surface via Au－S bonding and were exploited as the lithography mask to prevent the AFM tipinduced nanooxidation of MPTS and silicon substrate. It was found that the nanostructures formed on Si surface were dependent on the tipsample separation. With a certain bias voltage,scanning rate and relative humidity,adjusting the separation to 7.5 nm,nanopillar structures were obtained;while decreasing the separation to 5 nm,nanoring structures appeared . To explain the formation mechanism of these nanostructures,a hard ball model based on nanoparticle physical shielding effect was proposed.
- Atomic force microscope (AFM); ld nanoparticle;Local nanooxidation
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