Citation:
Wang Yu, Liu Guan-Kun, He Feng-Rong, Tong Ye-Xiang. Electrodeposition of Ho-Ni Alloy from Dimethyformamide Bath[J]. Acta Physico-Chimica Sinica,
;2001, 17(03): 206-209.
doi:
10.3866/PKU.WHXB20010304
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Cyclic voltammetry was used to study the electroreduction of Ho(III) i n Ho(NO3)3LiClO4DMF. The results showed that traces of water in this system blocked the electroreduct ion of Ho(III) by forming LiOH and Ho(OH)3 films on the electrode surface. Cod eposition of Ho and Ni was studied in dimethylformamide by cyclic voltammetry an d potentiostatic deposition at room temperature. Potentiostatic deposition was u sed to prepare HoNi alloys. EDAX, SEM and XRD were used to analyze the films. The results indicated that black, adhesive and amorphous HoNi alloy films on C u were produced where the content of Ho could be as high as 72.7 %.
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