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Citation: Zhang Yu, Jin Xin-Yu, Chen Kang-Sheng. Simulation Analysis of Active Particles in Plasma Polymerization Film Deposition[J]. Acta Physico-Chimica Sinica, ;2000, 16(10): 892-898. doi: 10.3866/PKU.WHXB20001006 shu

Simulation Analysis of Active Particles in Plasma Polymerization Film Deposition

1.
Department of Information and Electronic Engineering,Hangzhou 310027

Received Date: 13 January 2000
Available Online: 15 October 2000

The active particles movements in hydrogen, oxygen and nitrogen DC glow discharge plasma have been simulated and analyzed by applying the electromagnetic theories and Monte Carlo simulation techniques. The energy and spatial density distribution graphs have been obtained. By comparison with the active energy range of ions, the results showed that in hydrogen and oxygen plasma there are sufficient active ions to participate in the physical and chemical reactions with the monomer molecules, which resulted in high deposition speed; in nitrogen plasma there are very few ions with sufficient active energy, which resulted in low deposition speed.
- Particle enery,
- Monte Carlo simulation,
- Hydrogen
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