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Citation: Zhao Bi-Ying, Wang Qiu-Xia, Tang You-Qi. Study on Dispersion of V₂O₅ on Surface of SiO₂ and the Effect of Promoter K₂SO₄[J]. Acta Physico-Chimica Sinica, ;1993, 9(02): 187-192. doi: 10.3866/PKU.WHXB19930209 shu

Study on Dispersion of V₂O₅ on Surface of SiO₂ and the Effect of Promoter K₂SO₄

1.
Institute of Physical Chemistry, Peking University, Beijing 100871

Received Date: 11 November 1991
Available Online: 15 April 1993

It has been shown by in situ XRD that V_2O_5 can disperse spontaneously onto the surface of silica gel, but the dispersion temperature is relatively high. The presence of H_2O vapour inhibits the dispersion of V_2O_5 to a certain extent, The dispersion process of V_2O_5 onto the surface of silica gel can be accelerated by using K_2SO_4 as an additive. The surface acidity of V_2O_5/SiO_2 is quite strong. However, K_2SO_4 can suppress the acidity by neutralizing strong acid sites. This may be one of the important reasons why K_2SO_4 can improve the selectivity of V_2O_5/SiO_2 for many selective oxidations.
- V₂O₅/SiO₂ catalyst; Dispersion on surface; K₂SO₄ promoter
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沈阳化工大学材料科学与工程学院沈阳 110142

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Study on Dispersion of V2O5 on Surface of SiO2 and the Effect of Promoter K2SO4

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通讯作者: 陈斌, bchen63@163.com

Study on Dispersion of V₂O₅ on Surface of SiO₂ and the Effect of Promoter K₂SO₄