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Citation: Shao Shu-Min, Xi Guang-Kang, Wang Jun-Rong, Li Sheng-Lin, Yang Xue-Zhu, Wang Jin-He, Zhou Zhi-Qiang, He Tian-Xi, Yu Bao-Xia. Activated Chemisorption of CH₄ On Ni Surface and La Film[J]. Acta Physico-Chimica Sinica, ;1992, 8(06): 767-771. doi: 10.3866/PKU.WHXB19920610 shu

Activated Chemisorption of CH₄ On Ni Surface and La Film

1.
Department of Electron Science, Nankai University, Tianjin 300071

Received Date: 15 July 1991
Available Online: 15 December 1992

The effect of translational kinetic energy E_k on the activated chemisorption of CH_4 on Ni (polycrystal) surface and La film has been investigated using supersonic molecular beam technique. No dissociative adsorption was observed for CH_4/Ni system when E_k≤58.5 kJ·mol~(-1) and for CH_4/La system when E_k≤52.3 kJ·mol~(-1). Above these threshold values, the initial sticking probability s_0 increases linearly from 0 to 0.54 for CH_4/Ni system as E_k increases from 58.5 to 63.8 kJ·mol~(-1) and from 0 to 0.49 for CH_4/La system as E_k increases from 52.3 to 63.8 kJ·mol~(-1). These results indicate that a rather direct chemisorption process, rather than a classical precursor mechanism proceeds in these systems. Finally the apparent activation energies obtained are 46.8 kJ·mol~(-1) and 38.1 kJ·mol~(-1) for CH_4/Ni and CH_4/La systems respectively.
- CH₄; Ni; La; Activated chemisorption; Molecular beam technique
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Activated Chemisorption of CH4 On Ni Surface and La Film

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通讯作者: 陈斌, bchen63@163.com

Activated Chemisorption of CH₄ On Ni Surface and La Film