Citation: Zhiyuan Zhao, Yanwei Liu, Wenkang Shi, Yanyan Cao, Yiran Liu, Cheng Li, Chunlei Li, Lang Jiang, Yunlong Guo, Yunqi Liu. Direct high-resolution patterning of polymeric semiconductors by excimer vacuum ultraviolet lithography[J]. Chinese Chemical Letters, ;2026, 37(12): 112323. doi: 10.1016/j.cclet.2025.112323 shu

Direct high-resolution patterning of polymeric semiconductors by excimer vacuum ultraviolet lithography

Zhiyuan Zhao ^{a, b} ,
Yanwei Liu ^{a, b} ,
Wenkang Shi ^{a, b} ,
Yanyan Cao ^{a, b} ,
Yiran Liu ^{a, b} ,
Cheng Li ^{a, b} ,
Chunlei Li ^{a, b} ,
Lang Jiang ^{a, b, c} ,
Yunlong Guo ^{a, b, *,} ,
Yunqi Liu ^{a, b, *,}

a.
Beijing National Laboratory for Molecular Sciences, Chinese Academy of Sciences, Beijing 100190, China
b.
University of Chinese Academy of Sciences, Beijing 100049, China
c.
School of Chemical Engineering and Technology, Hebei University of Technology, Tianjin 300130, China

guoyunlong@iccas.ac.cn

liuyq@iccas.ac.cn

Received Date: 2 September 2025
Revised Date: 23 December 2025
Accepted Date: 24 December 2025
Available Online: 24 December 2025

Figures(4)

This study highlights the universality of 172 nm excimer vacuum ultraviolet (EVUL) etching for high-resolution patterning of polymer materials, achieving a resolution of ∼350 nm. The technique was successfully used to fabricate polymer thin-film transistor (PTFT) array consisting of 360 PTFTs, based on doped indaceno-dithiophene–benzothiadiazole (IDT-BT) films, achieving a significant reduction in off-state current by four orders of magnitude (from 10⁻⁵ A to 10⁻⁹ A). Additionally, an active PTFT-organic light-emitting diode (OLED) active-matrix circuit was fabricated, demonstrating the practical applicability of this method in organic optoelectronics. These results underscore the potential of 172 nm EVUL etching in enabling high-performance, polymer-based electronic circuit, with promising applications in flexible integrated circuit and displays.
- Direct patterning,
- High resolution,
- Polymeric semiconductors,
- Universal substrate compatibility,
- Active matrix,
- Excimer vacuum ultraviolet lithography (EVUL)
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