Citation: Jing Yang, Shou Li Bai, Rui Xian Luo, Ai Fan Chen, Yuan Lin, Jing Bo Zhang. Electrodeposition of SnO₂ nanocrystalline thin film using butyl-rhodamine B as a structure-directing agent[J]. Chinese Chemical Letters, ;2010, 21(12): 1505-1508. doi: 10.1016/j.cclet.2010.07.004 shu

Electrodeposition of SnO₂ nanocrystalline thin film using butyl-rhodamine B as a structure-directing agent

a State Key Laboratory of Chemical Resource Engineering, Beijing University of Chemical Technology, Beijing 100029, China;
b Beijing National Laboratory for Molecular Sciences, Key Laboratory of Photochemistry, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China

Received Date: 17 March 2010

Fund Project: This work was supported by the National Natural Science Foundation of China (Nos.20873162,50872007),the State Key Laboratory of Pollution Control and Resource Reuse Foundation (No.PCRRF09006) and Beijing Natural Science Foundation (No.8092022).

Porous SnO₂ nanocrystalline thin films were successfully electrodeposited from an oxygen-saturated acid aqueous solution of SnCl₂ containing different concentrations of butyl-rhodamine B (BRhB) at 70℃. BRhB with substitute of amidocyanogen can be dissolved in the acid deposition solution, where HCl was added to suppress hydrolysis of SnCl₂. So it was used as a structure-directing agent to promote the crystal growth of SnO₂. The formed porous morphology and tetragonal rutile crystalline structure of the electrodeposited thin films were controlled by the addition of BRhB with different amounts.
- Naaocrystalline SnO₂ thin film,
- Electrodeposition,
- Butyl-rhodamine B,
- Structure-directing agent
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