Citation: Niancai Cheng, Xueliang(Andy) Sun. Single atom catalyst by atomic layer deposition technique[J]. Chinese Journal of Catalysis, ;2017, 38(9): 1508-1514. doi: 10.1016/S1872-2067(17)62903-6 shu

Single atom catalyst by atomic layer deposition technique

Niancai Cheng ^a,b, ,
Xueliang(Andy) Sun ^a

a Department of Mechanical and Materials Engineering, University of Western Ontario, London, ON N6A 5B9, Canada;
b College of Materials Science and Engineering, Fuzhou University, Fuzhou 350108, Fujian, China

Received Date: 6 July 2017
Revised Date: 14 August 2017

Noble single-atom catalysts have rapidly been attracting attention due to their unique catalytic properties and maximized utilization. Atomic layer deposition (ALD) is an emerging powerful tech-nique for large-scale synthesis of stable single atom. In this review, we summarize recent develop-ments of single atom synthesized by ALD as well as explore future research direction and trends.
- Single-atom,
- Atomic layer deposition,
- Catalysis,
- Noble catalyst,
- Mechanism
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