Citation: Lan HUANG, Li Na XU, Hao Ying SHEN, Hai Qian ZHANG, Ning GU. Micro-patterning of Copper Based on Photolithographed Self-assembly Monolayers[J]. Chinese Chemical Letters, ;2002, 13(2): 163-164. shu

Micro-patterning of Copper Based on Photolithographed Self-assembly Monolayers

1.
National Laboratory of Molecular and Biomolecular Electonics, Southeast University, Nanjing 210096;
2.
Institute of Electron Devices, Nanjing 210016

Received Date: 16 July 2001

Fund Project: This work was supported by the National Natural Science Foundation of the People's Republic of China (No.69890220).

A new method has been developed for fabrication of copper micro-pattern by selective chemical copper deposition based on photolithographed (3-mercaptopropyl)-trimethoxysilane (MPTS) self-assembly monolayers (SAMs).As confirmed by scanning electron microscopy (SEM), Cu closely replicated the mask features.The present approach makes this technic to be cheap and may be applicable to assembly of microelectronic circuits.
- Micro-pattern,
- deposition,
- photolithograph,
- SAMs,
- MPTS,
- SEM
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