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Citation: XU Xiao-Hong, WU Hai-Shun, ZHANG Fu-Qiang, ZHANG Cong-Jie, JIN Zhi-Hao. Component Analysis of the AlN Thin Films[J]. Chinese Journal of Applied Chemistry, ;2001, 18(3): 233-235. shu

Component Analysis of the AlN Thin Films

1.
a Department of Chemistry, Shanxi Normal University, Linfen 041004;
2.
b School of Materials Science and Engineering, Xi'an

Received Date: 25 June 2000
Available Online: 20 December 2000
Fund Project: 国家自然科学基金(29741004) (29741004)

The component of the surface and profile of AlN films have been investigated using X-ray photoelectron spectrometry (XPS).The results show that the surface of the films was composed by Al,N,O and C elements.C and O contaminations are attributed both to the sputtering chamber venting and to exposure of the films to air.According XPS depth profile analysis,it is found that the composition of the film along the growth axis is nearly uniform,and Al/N ratio is close to that in the AlN stoichiometry.Beneath the surface,the amount of O in the film is found below 5%.
- AlN thin film,
- component,
- XPS
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