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Citation: LÜ Hong-Hui, WEN Zi, QIAN Xin-Ming, TANG Xin-Yi, BAI Yu-Bai. The Effect of the Thickness of α-Fe₂O₃ Nanocrystalline Thin Film on the Photocurrent Response[J]. Chinese Journal of Applied Chemistry, ;2001, 18(10): 777-780. shu

The Effect of the Thickness of α-Fe₂O₃ Nanocrystalline Thin Film on the Photocurrent Response

1.
a Department of Applied Chemistry(Nanling Campus), Jilin University, Changchun;
2.
b Department of Chemistry(Qianwei Campus), Jilin University, Changchun 130023

Received Date: 8 March 2001
Available Online: 15 June 2001
Fund Project: 国家自然科学基金(29773017) (29773017)

The photoelectrochemistry of α-Fe₂O₃ nanocrystalline thin films with different thickness in KCl solution was studied. It is found that the photocurrent response was decreased with the film thinkness. The decrease of photocurrent responses of thicker films is explained in terms of the electric resistance effect and recombination effect. For thinner α-Fe₂O₃ film (50 μm) no difference was found for the photocurrent response under frontwall (FW) and backwall (BW) illuminations, while for thicker α-Fe₂O₃ film (100 μm) the photocurrent response was larger under BW illumination than that under FW illumination.
- α-Fe₂O₃,
- nanocrystalline thin film,
- photoelectrochemistry
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The Effect of the Thickness of α-Fe₂O₃ Nanocrystalline Thin Film on the Photocurrent Response