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Citation: WU Wen-Qiang, KE Xu, HUANG Ye, WANG Yue-Chuan. A New Photoresist For Glass Etching[J]. Chinese Journal of Applied Chemistry, ;2007, 24(2): 134-138. shu

A New Photoresist For Glass Etching

1.
State Key Lab for Polymer Materials Engineering, College of Polymer Science and Engineering, Sichuan University, Chengdu 610065

Corresponding author: WANG Yue-Chuan,
Received Date: 25 March 2006
Available Online: 15 June 2006
Fund Project: 国家教育部骨干教师计划资助项目(20006511) (20006511)

Photoresists made of hyperbranched polyesters modified with epoxy resin were prepared and used as glass etching mask.Photo-reactivity of the modified hyperbranched polyesters,resistance of the mask to the etching agents composed of HCl,HNO₃ and HF,and the glass etching were studied.Adhesion of the mask film to glass is improved by the hyperbranched polyesters modified with epoxy resin.Sensitivity(T_0,gel) and contrast(γ_gel) of the photoresists are 2.7 s and 2.8,respectively.The wet etching agents made of HF,HCl and HNO₃ exhibit high etching rates(≥35μm/min).Photoresists made of the modified photo reactive hyper-branched polyesters were photo patterned and were used as the mask for glass etching.Clear etching patterns on the glass plates with line width of 50μm were prepared.Etching depth over 38μm was also realized.
- glass etching,
- photoresist,
- mask film,
- hyperbranched polyester
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