Citation: WANG Hengwei, LU Junling. Atomic Layer Deposition: A Gas Phase Route to Bottom-up Precise Synthesis of Heterogeneous Catalyst[J]. Acta Physico-Chimica Sinica, ;2018, 34(12): 1334-1357. doi: 10.3866/PKU.WHXB201804201 shu

Atomic Layer Deposition: A Gas Phase Route to Bottom-up Precise Synthesis of Heterogeneous Catalyst

WANG Hengwei ¹ ,
LU Junling ^1,2,,

1.
Department of Chemical Physics, Hefei National Laboratory for Physical Sciences at the Microscale, iChEM, University of Science and Technology of China, Hefei 230026, P. R. China
2.
CAS Key Laboratory of Materials for Energy Conversion, University of Science and Technology of China, Hefei 230026, P. R. China

Author Bio:
Prof. LU Junling received his PhD degree from Institute of Physics, Chinese Academy of Sciences under the supervision of Prof. Hongjun Gao in 2007. During his PhD studies, he visited Prof. Hans-Joachim Freund group at Chemical Physics Department, Fritz-Haber-Institute, Max Planck Society as an exchange student in 2004-2006. After graduation, he spent three years in Prof. Peter C Stair's group at Northwestern University and then about two and a half years in Dr. Jeffrey W. Elam's group at Argonne National Laboratory as a Postdoc. In March. 2013, he became a professor at University of Science and Technology of China. His current research interest is atomically-precise design of new catalytic materials using a combined wet-chemistry and atomic layer deposition (ALD) approach for advanced catalysis
Corresponding author: LU Junling, junling@ustc.edu.cn
Received Date: 27 March 2018
Revised Date: 15 April 2018
Accepted Date: 16 April 2018
Available Online: 23 December 2018
Fund Project: the Fundamental Research Funds for the Central Universities, China WK2060030029the National Natural Science Foundation of China 21473169the National Natural Science Foundation of China 51402283The project was supported by the National Natural Science Foundation of China (21673215, 21473169, 51402283), the Fundamental Research Funds for the Central Universities, China (WK2060030029, WK6030000015), and the Max-Planck Partner Groupthe National Natural Science Foundation of China 21673215the Fundamental Research Funds for the Central Universities, China WK6030000015

Heterogeneous catalysts are usually synthesized by the conventional wet-chemistry methods, including wet-impregnation, ion exchange, and deposition-precipitation. With the development of catalyst synthesis, great progress has been made in many industrially important catalytic processes. However, these catalytic materials often have very complex structures along with poor uniformity of active sites. Such heterogeneity of active site structures significantly decreases catalytic performance, especially in terms of selectivity, and hinders atomic-level understanding of structure-activity relationships. Moreover, loss of exposed active components by sintering or leaching under harsh reaction conditions causes considerable catalyst deactivation. It is desirable to develop a facile method to tune catalyst active site structures, as well as their local chemical environments on the atomic level, thereby facilitating reaction mechanisms understanding and rational design of catalysts with high stability. Atomic layer deposition (ALD), a gas-phase technique for thin film growth, has emerged as an alternative method to synthesize heterogeneous catalysts. Like chemical vapor deposition (CVD), ALD relies on a sequence of molecular-level, self-limiting surface reactions between the vapors of precursor molecules and a substrate. This unique character makes it possible to deposit various catalytic materials uniformly on a high-surface-area support with nearly atomic precision. By tuning the number, sequence, and types of ALD cycles, bottom-up precise construction of catalytic architectures on a support can be achieved. In this review, we focus on the design and synthesis of supported metal catalysts using ALD. We first review strategies developed to precisely tailor the size, composition, and structures of metal nanoparticles (NPs) using ALD. Catalytic performances of these ALD metal catalysts are also discussed and compared to conventional catalysts. We highlight synthetic strategies for synthesis of metal single-atom catalysts and bottom-up precise synthesis of dimeric metal catalysts. Their impact on catalysis is discussed. We demonstrate that metal oxide ALD on metal NPs can enhance catalytic activity, selectivity, and especially stability. In particular, we show that site-selective blocking of metal NPs with an oxide overcoat improves selectivity and contributes to an understanding of the distinct functionalities of the low-and high-coordination sites in catalytic reactions on the atomic level. Next, we discuss an effective method to construct bifunctional catalysts via precisely-controlled addition of a secondary functionality using ALD. Finally, we summarize the advantages of ALD for the advanced design and synthesis of catalysts and discuss the challenges and opportunities of scaling up ALD catalyst synthesis for practical applications.
- Atomic layer deposition,
- Supported metal catalyst,
- "Bottom-up" synthesis,
- Single-atom catalyst,
- Dimeric metal catalysts,
- Metal-oxide interfaces,
- Confinement effect
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