Citation: HUANG Ya-Yu, FANG Qiu-Yan, ZHOU Jian-Zhang, ZHAN Dong-Ping, SHI Kang, TIAN Zhong-Qun. Deposition and Inhibition of Cu on TiO₂ Nanotube Photoelectrode in Photoinduced Confined Etching System[J]. Acta Physico-Chimica Sinica, ;2017, 33(10): 2042-2051. doi: 10.3866/PKU.WHXB201705125 shu

Deposition and Inhibition of Cu on TiO₂ Nanotube Photoelectrode in Photoinduced Confined Etching System

State Key Laboratory of Physical Chemistry of Solid Surfaces and Department of Chemistry, College of Chemistry and Chemical Engineering, Xiamen University, Xiamen 361005, Fujian Province, P. R. China

Received Date: 13 April 2017
Revised Date: 2 May 2017

Fund Project: The project was supported by the National Natural Science Foundation of China (91023043, 21021002, 91023006).

A photoinduced confined etching system was used for the unstressed chemical planarization of Cu. Cu deposits were found on the surface of TiO₂ nanotubes of the tool during the photoinduced confined etching of the Cu workpiece. Scanning electron microscopy, energy-dispersive X-ray spectroscopy, and X-ray photoelectron spectroscopy were used to analyze the morphology and composition of the Cu deposits, and the mechanism of the photodeposition of Cu in the micro/nanoscale liquid layer between the tool and the workpiece was investigated. Moreover, a simulated cupric solution was used to study the effect of the Cu deposits during the photoinduced confined etching. Several routes including stirring and complexing agent were used to investigate the inhibition of Cu deposition on the surface of TiO₂ nanotubes and the simultaneous effect on the etching of Cu workpiece. The results showed that the Cu deposits enhanced the photocatalytic performance of TiO₂ nanotubes, but the mechanism of enhancement changed with the increase in Cu deposits. Inhibition of Cu deposition by improving mass transfer can lead to the increase in the etching of Cu; addition of complexing agent combined with enhanced mass-transfer can inhibit Cu deposition, while improving the planing effect. Thus, the choice of inhibition methods and conditions should balance the effect of the micro/nano liquid layer between the tool and workpiece on multiple chemical reactions and mass transfer processes. The results provide an important guiding significance for further regulation and optimization of the photoinduced confined etching system.
- Photo-induced confined etching,
- TiO₂ nanotube arrays,
- ·OH,
- Scavenging agent,
- Photo-deposition of Cu,
- Mass transfer
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Deposition and Inhibition of Cu on TiO₂ Nanotube Photoelectrode in Photoinduced Confined Etching System