Citation: HU Yan, FANG Qiu-Yan, ZHOU Jian-Zhang, ZHAN Dong-Ping, SHI Kang, TIAN Zhong-Qun, TIAN Zhao-Wu. Factors Influencing Hydroxyl Radical Formation in a Photo-Induced Confined Etching System[J]. Acta Physico-Chimica Sinica, ;2013, 29(11): 2392-2398. doi: 10.3866/PKU.WHXB201309043 shu

Factors Influencing Hydroxyl Radical Formation in a Photo-Induced Confined Etching System

  • Received Date: 9 July 2013
    Available Online: 4 September 2013

    Fund Project: 国家自然科学基金(91023043,21021002,91023006)资助项目 (91023043,21021002,91023006)

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