Citation:
HU Yan, FANG Qiu-Yan, ZHOU Jian-Zhang, ZHAN Dong-Ping, SHI Kang, TIAN Zhong-Qun, TIAN Zhao-Wu. Factors Influencing Hydroxyl Radical Formation in a Photo-Induced Confined Etching System[J]. Acta Physico-Chimica Sinica,
;2013, 29(11): 2392-2398.
doi:
10.3866/PKU.WHXB201309043
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In this paper, we studied the formation of free ·OH on a TiO2 nanotube array electrode in a photo-induced confined etching system. We used fluorescence spectroscopy, transient photocurrent response, electrochemical impedance spectroscopy (EIS), and Mott-Schottky analysis to investigate the influence of several key factors, including the applied potential, the illumination time, and the pHvalue. The highest efficiency for the photoelectrocatalytic formation of free ·OH on the TiO2 nanotube array electrode was achieved at an applied potential of 1.0 V (vs a saturated calomel electrode (SCE)); the photoelectrocatalytic generation and consumption of free ·OH quickly approached a steady state in this system, as the confined etching layer formed by ·OH remained stable during illumination. This may allow od control of the etching precision during continuous etching processes. The highest efficiency for the photoelectrocatalytic formation of free ·OH on the TiO2 nanotube array electrode was observed at pH10. The results have an important significance for regulating and optimizing photo-induced confined etching system, which can be used to improve the etching speed or the leveling precision during the planarization of copper.
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