Citation: CHANG Da-Lei, LI Xiao-Song, ZHAO Tian-Liang, ZHU Ai-Min. Diagnosis of Emission Spectra on Chemical Vapor Deposition of TiO₂ System with Atmospheric-Pressure Radio Frequency Plasma[J]. Acta Physico-Chimica Sinica, ;2013, 29(03): 625-630. doi: 10.3866/PKU.WHXB201212271 shu

Diagnosis of Emission Spectra on Chemical Vapor Deposition of TiO₂ System with Atmospheric-Pressure Radio Frequency Plasma

1.
Laboratory of Plasma Physical Chemistry, Dalian University of Technology, Dalian 116024, Liaoning Province, P. R. China

Received Date: 16 October 2012
Available Online: 27 December 2012
Fund Project: 国家自然科学基金(10835004, 51077009)资助项目 (10835004, 51077009)

Diagnosis of emission spectroscopy on chemical vapor deposition (PCVD) of TiO₂ with atmospheric-pressure radio frequency (RF) plasma was studied. The dependences of relative intensity of atomic oxygen line, Ar excitation temperature, OH rotational and vibrational temperatures were investigated on partial pressures of O₂ and titanium tetraisopropoxide (TTIP) and input power, respectively. The relative intensity of the atomic oxygen line rapidly increased to a maximum and slowly decreased with increasing O₂ partial pressure. OH vibrational temperature gradually increased, whereas Ar excitation temperature and OH rotational temperature showed little change. The relative intensity of the atomic oxygen line decreased, Ar excitation temperature remained constant, and OH vibrational and rotational temperatures increased with increasing TTIP partial pressure. The relative intensity of atomic oxygen line decreased, whereas the Ar excitation temperature and OH vibrational and rotational temperatures increased with increasing input power.
- Atmospheric-pressure radio frequency plasma,
- Dielectric barrier discharge,
- Plasma chemical vapour deposition,
- Diagnosis of optical emission spectrum,
- TiO₂
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沈阳化工大学材料科学与工程学院沈阳 110142

Diagnosis of Emission Spectra on Chemical Vapor Deposition of TiO2 System with Atmospheric-Pressure Radio Frequency Plasma

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通讯作者: 陈斌, bchen63@163.com

Diagnosis of Emission Spectra on Chemical Vapor Deposition of TiO₂ System with Atmospheric-Pressure Radio Frequency Plasma