Citation: LI Jian-Ling, GAO Fei, ZHANG Ya-Kun, HE Li-Zhi, HAN Gui-Mei, WANG Xin-Dong. Electropolymerization of Nickel Complexes with Schiff Bases: Effect of Sweep Rate on Anodic Polymerization[J]. Acta Physico-Chimica Sinica, ;2010, 26(10): 2647-2652. doi: 10.3866/PKU.WHXB20100940
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Anodic electrochemical polymerization of N,N'-ethylenbis (salicylideneaminato) nickel(II) ([Ni(salen)]) in tetrabutylammonium perchlorate (TBAP)/acetonitrile (AN) was investigated by the linear sweep potential method. The sweep rate ranged from 5 to 150 mV·s-1. The effect of sweep rate on the growth of poly[Ni(salen)] was studied by Coulomb analysis. The morphologies of poly[Ni(salen)] were characterized by field emission scanning electron microscopy (FESEM). The relationship between the growth rate of poly[Ni(salen)] (dΓ/dm) and the sweep rate (v) fits the exponential degradation equation. The content of the redox center for poly[Ni(salen)], grown at sweep rate of 20 mV·s-1, reaches a maximum and then decreases as the sweep rate increases because monomer diffusion restricts the growth of poly[Ni(salen)]. We studied the effect of polymerization sweep rate on the kinetics of the as-grown poly[Ni (salen)] by cyclic voltammetry. The charge diffusion coefficient (D) of poly[Ni(salen)] grown at a sweep rate of 20 mV·s-1 was found to be the highest.
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