Citation: CHEN Yang, JING Fen-Ning, YE Wei-Chun, WANG Chun-Ming. Autocatalytic Electroless Deposition of Palladium onto p-Silicon (100)[J]. Acta Physico-Chimica Sinica, ;2007, 23(11): 1743-1746. doi: 10.3866/PKU.WHXB20071117
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The autocatalytic electroless deposition (AED) of palladiumonto p-silicon (100) with hydrogen termination was studied. Pd films were prepared by immersing the hydrogen-terminated silicon wafers into conventional HF-PdCl2-HCl solution at room temperature. The anodic stripping behaviors and morphologies of the Pd deposits were studied using cyclic voltammetry (CV), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). The results showed that the Pd growth was in Volmer-Weber (VW) mode and the Pd filmhad od adhesion.
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