引用本文:
吴树新, 马智, 秦永宁, 何菲, 贾立山, 张彦军. 掺铜二氧化钛光催化剂的XPS研究[J]. 物理化学学报,
2003, 19(10): 967-969.
doi:
10.3866/PKU.WHXB20031017
Citation: Wu Shu-Xin, Ma Zhi, Qin Yong-Ning, He Fei, Jia Li-Shan, Zhang Yan-Jun. XPS Study of Copper Doping TiO2 Photocatalyst[J]. Acta Physico-Chimica Sinica, 2003, 19(10): 967-969. doi: 10.3866/PKU.WHXB20031017
Citation: Wu Shu-Xin, Ma Zhi, Qin Yong-Ning, He Fei, Jia Li-Shan, Zhang Yan-Jun. XPS Study of Copper Doping TiO2 Photocatalyst[J]. Acta Physico-Chimica Sinica, 2003, 19(10): 967-969. doi: 10.3866/PKU.WHXB20031017
掺铜二氧化钛光催化剂的XPS研究
摘要:
利用浸渍法制备了铜掺杂的二氧化钛，以乙酸为模型物研究了催化剂的光催化活性，利用XPS结果对改性后的催化剂进行了分析.结果表明，改性后的催化剂表面吸附氧的提高和Cu＋/Cu2＋的共存有利于光生载流子的分离和界面电子转移，因而改善了催化剂的光催化性能.
English
XPS Study of Copper Doping TiO2 Photocatalyst
Abstract:
The copper doped titanium dioxide was prepared by immersion method. Photocatalytic activity was investigated with acetic acid as a model reactant, and the photocatalyst was analyzed by means of XPS. The enhanced degradation rate of acetic acid is attributed to increased charge separation and interfacial charge-transfer rate on the surface of the doped photocatalyst.
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