Citation: Chen Yu-Yin, Liu Fan. Stoichiometric Displacement Model for the Adsorption of Propionic Acid and nButyric Acid by Silica Gel from Aqueous Solution[J]. Acta Physico-Chimica Sinica, ;2002, 18(01): 62-65. doi: 10.3866/PKU.WHXB20020114
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The adsorption of propionic acid and nbutyric acid from aqueous solution by silica gel has been studied at 293,303 and 313 K respectively.It was found that the adsorption obey stoichoimetric displacement model for adsorption at liquidsolid system (SDMA). The thermodynamics and mechanism of adsorption processes were studied on the basis of linear parameter from SDMA. The adsorption is a spontaneous, exothermic process of reduced entropy. Standard free energy change for the adsorption of nbutyric acid is larger than that of propionic acid. Standard enthalpy change for the adsorption of nbutyric acid is smaller than that of propionic acid. The equation of free energy change for adsorption was derived.
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