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Citation: Li Hao-Hua, Li Chao, Li Wei, Li Cheng-Xian, Ge Shi-Hui. Giant Magnetoresistance in Electro-deposited Co-Cu Granular Film[J]. Acta Physico-Chimica Sinica, ;2000, 16(06): 573-576. doi: 10.3866/PKU.WHXB20000619 shu

Giant Magnetoresistance in Electro-deposited Co-Cu Granular Film

1.
School of Physical Science and Technology,Lanzhou University,Lanzhou 730001

Received Date: 27 September 1999
Available Online: 15 June 2000

CoxCu100-x granular films were prepared by electro deposition(ED). The relationship between Co concentration and ED potential, as well as the influence of ED and annealing conditions on GMR have been studied. It is found that the maximum value of GMR depends on the annealing temperature and Co concentration. After annealing Co16Cu84 sample at 425 ℃, we t the maximum value of GMR with -5 %at room temperature, 1100 kA•m-1 and -10% at 77 K, 650 kA•m-1. TEM measurement was used to study the microstructure and the explanation of explain the results.
- Electro-deposition,
- Granular films,
- Giant magnetoresistance(GMR)
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沈阳化工大学材料科学与工程学院沈阳 110142

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Giant Magnetoresistance in Electro-deposited Co-Cu Granular Film

南开大学师唯/华北电力大学（保定）刘景维：二维配位聚合物中有序的亲锂冠醚位点用于无枝晶锂沉积

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通讯作者: 陈斌, bchen63@163.com