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Citation: Deng Guo-Yang, Jes Henningsen. Quantitative Measurement of Adsorption of CH₃OH on Commonly Used Mterials by Photoacoustic Method[J]. Acta Physico-Chimica Sinica, ;1999, 15(08): 764-768. doi: 10.3866/PKU.WHXB19990819 shu

Quantitative Measurement of Adsorption of CH₃OH on Commonly Used Mterials by Photoacoustic Method

1.
Zhongnan Institute of Technology,Hengyang 421001

Received Date: 8 December 1998
Available Online: 15 August 1999

A photoacoustic method to quantitatively measure the adsorption of CH_3OH on gas-solid interface is presented. The adsorption of CH_3OH on such commonly used materials as quartz, pyrex, polytetrafluoroethylene teflon, petheoroalcoxy teflon and polished stainless steel SS316 is measured. Kinetic simulation can explain the experimental results, thus providing a basis for the generalization of the experimental results. The adsorption property of the materials at reduced temperature is also studied.
- Photoacoustic method,
- Adsorption,
- Methyl alcohol
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Quantitative Measurement of Adsorption of CH3OH on Commonly Used Mterials by Photoacoustic Method

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通讯作者: 陈斌, bchen63@163.com

Quantitative Measurement of Adsorption of CH₃OH on Commonly Used Mterials by Photoacoustic Method