Citation: Cao Ya-An, Xie Teng-Feng, Zhang Xin-Tong, Guan Zi-Sheng, Ma Ying, Wu Zhi-Yun, Bai Yu-Bai, Li Tie-Jin, Yao Jian-Nian. Investigation on Surface State of TiO2 Nanoprticulate Film[J]. Acta Physico-Chimica Sinica, ;1999, 15(08): 680-683. doi: 10.3866/PKU.WHXB19990803
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TiO_2 nanoparticulate films were prepared by means of Plasma-enhanced Chemical Vapor Deposition (PECVD). By further surface treatment by TiCl_4 or O_2 plasma, films with different surface properties were obtained. It was found that treatment by TiCl4 plasma enhanced the amount of Ti3+ surface state and Ti dislocation of the film, detected by the surface photovoltage spectroscopy, while O_2 plasma surface treating enhanced its amount of O_2 surface state. It was also indicated by the H_2O adsorption experiment that film treated by O_2 plasma had larger separation efficiency for photogenerated carriers than the one treated by TiCl_4 plasma.
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Keywords:
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PECVD
, - TiO2 nanoparticulate film,
- SPS,
- Surface treatment,
- Surface state
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