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Citation: Xu Gang, Cao Chu-Nan, Lin Hai-Chao, Zhang Jian-Qing. Influences of In³⁺ and Ga³⁺ on the Electrochemical Behaviour of Al in KOH Solution[J]. Acta Physico-Chimica Sinica, ;1998, 14(01): 27-32. doi: 10.3866/PKU.WHXB19980106 shu

Influences of In³⁺ and Ga³⁺ on the Electrochemical Behaviour of Al in KOH Solution

1.
State Key Laboratory for Corrosion Protection,Institute of Corrosion Protection of Metals,Academia Sinica,Shenyang 110015

Received Date: 14 April 1997
Available Online: 15 January 1998

Electrochemical Behaviors of Al in 1 mol•L-1 KOH solution without and with the addition of In3+or Ga3+ were investigated with potentiodynamic polarization and EIS techniques. Corrosion rates were measured by volumes of hydrogen evolved. The results show that though indium and gallium are the metals with high H2-evolution voltage, addition of In3+retards both anodic and cathodic reaction of the corrosion of Al in KOH solution and thus inhibits the corrosion, while Ga3+ accelerates the anodic dissolution process as well as the corrosion of Al in the solution. SEM verified the above results.
- Potentiodynamic polarization,
- EIS,
- High H2-evolution voltage,
- In3+,
- Ga3+,
- Al dessolution
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Influences of In3+ and Ga3+ on the Electrochemical Behaviour of Al in KOH Solution

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通讯作者: 陈斌, bchen63@163.com

Influences of In³⁺ and Ga³⁺ on the Electrochemical Behaviour of Al in KOH Solution