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Citation: Li Yu-Ming, Li Shan-Dong, Lin Hong-Yi. Nanometer Semiconductor Films and It's Application[J]. Acta Physico-Chimica Sinica, ;1997, 13(11): 1052-1056. doi: 10.3866/PKU.WHXB19971119 shu

Nanometer Semiconductor Films and It's Application

1.
Haerbin University of Technology,Haerbin 150080

Received Date: 18 February 1997
Available Online: 15 November 1997

Hydrogenated nano-crystalline silicon (nc-Si:H) films have been prepared by plasma enhanced chemical vapor deposition (PECVD) method under ri rously controlled conditions of deposition. The nc-Si:H films consist of a mass of nanometer scale grains and an interfacial region, i.e. the crystalline phase and the grain boundary phase. It is especially valuable for use in some devices, for example, quantum function devices and film sensors etc.
- Semiconductor materials,
- N ano-crystalline semiconductor,
- Quantum function devices
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