Citation: Jiaxin Zhou, Li Zhao, Qiang Wang, Lixin Zuo, Ana Zhao, Huimin Yu, Xue Jiang, Xiaoli Xiong. Plasma-induced chemical etching generating Ni₃S₂ for formaldehyde detection[J]. Chinese Chemical Letters, ;2022, 33(6): 3035-3038. doi: 10.1016/j.cclet.2021.09.024 shu

Plasma-induced chemical etching generating Ni₃S₂ for formaldehyde detection

College of Chemistry and Materials Science, Sichuan Normal University, Chengdu 610068, China

jiangxue@sicnu.edu.cn

xiongxiaoli2000@163.com

Received Date: 1 June 2021
Revised Date: 29 July 2021
Accepted Date: 6 September 2021
Available Online: 10 September 2021

Figures(3)

In this paper, Ni₃S₂ nanosheet (NS) was generated by chemical etching with sodium sulfide directly on the nickel foam (NF), which was induced by dielectric barrier discharge plasma in liquid. Compared with other chemical etching methods of nickel-based nanomaterials, this method was not only rapid (40 min) and mild (at room temperature and atmospheric pressure), but also showed consistent stability and good reproducibility. The Ni₃S₂ NS/NF electrode showed excellent performance in the electrochemical detection of formaldehyde under alkaline conditions. It had a good linear relationship with the concentration of formaldehyde in the range of 0.002-5.45 mmol/L (R² = 0.9957) and the limit of detection (LOD) was 1.23 µmol/L (S/N = 3). The sensitivity was 1286.9 µA L mmol^‒1 cm^‒2, and the response time was about 5 s. The plasma-induced chemical etching strategy provides a simple and stable electrode preparation method, which has great application prospects in nonenzymatic electrochemical sensors.
- Chemical etching,
- Microplasma,
- Electrochemical detection,
- Formaldehyde
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Plasma-induced chemical etching generating Ni₃S₂ for formaldehyde detection