Citation: Kun Chen, Keke Mao, Yu Bai, Delong Duan, Shuangming Chen, Chengming Wang, Ning Zhang, Ran Long, Xiaojun Wu, Li Song, Yujie Xiong. Phosphate-induced interfacial electronic engineering in VPO4-Ni2P heterostructure for improved electrochemical water oxidation[J]. Chinese Chemical Letters, ;2022, 33(1): 452-456. doi: 10.1016/j.cclet.2021.05.011 shu

Phosphate-induced interfacial electronic engineering in VPO4-Ni2P heterostructure for improved electrochemical water oxidation

    * Corresponding authors.
    ** Corresponding author at: Institute of Energy, Hefei Comprehensive National Science Center, Hefei 230031, China.
    E-mail addresses: polyu.n.zhang@polyu.edu.hk (N. Zhang), longran@ustc.edu.cn (R. Long), yjxiong@ustc.edu.cn (Y. Xiong).
    1 These authors contributed equally to this work.
  • Received Date: 13 April 2021
    Revised Date: 29 April 2021
    Accepted Date: 10 May 2021
    Available Online: 18 May 2021

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