Citation: Xuhe Li, Jian Zhang, Feng Zhou, Hongliang Zhang, Jin Bai, Yanjuan Wang, Haiyan Wang. Preparation of N-vacancy-doped g-C₃N₄ with outstanding photocatalytic H₂O₂ production ability by dielectric barrier discharge plasma treatment[J]. Chinese Journal of Catalysis, ;2018, 39(6): 1090-1098. doi: 10.1016/S1872-2067(18)63046-3 shu

Preparation of N-vacancy-doped g-C₃N₄ with outstanding photocatalytic H₂O₂ production ability by dielectric barrier discharge plasma treatment

a Liaoning Key Laboratory of Petroleum & Chemical Industry, Liaoning Shihua University, Fushun 113001, Liaoning, China;
b Fushun Research Institute of Petroleum and Petrochemicals, SINOPEC, Fushun 113001, Liaoning, China

Received Date: 29 December 2017
Revised Date: 27 January 2018

Fund Project: This work was supported by the Pilot Program of University of Liaoning Innovation and Education Reform.

Dielectric barrier discharge (DBD) plasma is considered to be a promising method to synthesize solid catalysts. In this work, DBD plasma was used to synthesize a nitrogen-vacancy-doped g-C₃N₄ catalyst in situ for the first time. X-ray diffraction, N₂ adsorption, ultraviolet-visible spectroscopy, scanning electron microscopy, transmission electron microscopy, X-ray photoelectron spectroscopy, electrochemical impedance spectroscopy, electron paramagnetic resonance, O₂ temperature-programmed desorption, and photoluminescence were used to characterize the obtained catalysts. The photocatalytic H₂O₂ production ability of the as-prepared catalyst was investigated. The results show that plasma treatment influences the morphology, structure, and optical properties of the as-prepared catalyst. Nitrogen vacancies are active centers, which can adsorb reactant oxygen molecules, trap photoelectrons, and promote the transfer of photoelectrons from the catalyst to the adsorbed oxygen molecules for the subsequent reduction reaction. This work provides a new strategy for synthesizing g-C₃N₄-based catalysts.
- Dielectric barrier discharge plasma,
- Graphitic carbon nitride,
- H₂O₂ production,
- Nitrogen vacancies,
- Photocatalysis
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Preparation of N-vacancy-doped g-C₃N₄ with outstanding photocatalytic H₂O₂ production ability by dielectric barrier discharge plasma treatment