Citation: Xiao-sa Jin, Yuan-yuan Pang, Sheng-xiang Ji. From Self-assembled Monolayers to Chemically Patterned Brushes: Controlling the Orientation of Block Copolymer Domains in Films by Substrate Modification[J]. Chinese Journal of Polymer Science, ;2016, 34(6): 659-678. doi: 10.1007/s10118-016-1800-x shu

From Self-assembled Monolayers to Chemically Patterned Brushes: Controlling the Orientation of Block Copolymer Domains in Films by Substrate Modification

a.
Key Laboratory of Polymer Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun 130022, China
b.
University of Chinese Academy of Sciences, Beijing 100049, China

Corresponding author: Sheng-xiang Ji, sji@ciac.ac.cn
Received Date: 18 February 2016
Revised Date: 13 March 2016
Accepted Date: 2 March 2016

Fund Project: This work was financially supported by the National Natural Science Foundation of China Nos. 51173181 and 51373166"The Hundred Talents Program" from the Chinese Academy of Sciences and the International S&T Cooperation Program from Department of Science and Technology of Jilin Province No. 20160414032GH

Block copolymer lithography is emerging as one of the leading technologies for patterning nanoscale dense features. In almost all potential applications of this technology, control over the orientation of cylindrical and lamellar domains is required for pattern transfer from the block copolymer film. This review highlights the state-of-art development of brushes to modify the substrates to control the assembly behaviors of block copolymers in films. Selected important contributions to the development of self-assembled monolayers, polymer brushes and mats, and chemically patterned brushes are discussed.
- Self-assembly,
- Block copolymer,
- Neutral brush,
- Chemical pattern,
- Wetting behavior
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