引用本文:
Hui Zhou, Lan Jin, Wei Xu. New approach to fabricate nanoporous gold film[J]. Chinese Chemical Letters,
2007, 18(3): 365-368.
doi:
10.1016/j.cclet.2007.01.001
Citation: Hui Zhou, Lan Jin, Wei Xu. New approach to fabricate nanoporous gold film[J]. Chinese Chemical Letters, 2007, 18(3): 365-368. doi: 10.1016/j.cclet.2007.01.001

Citation: Hui Zhou, Lan Jin, Wei Xu. New approach to fabricate nanoporous gold film[J]. Chinese Chemical Letters, 2007, 18(3): 365-368. doi: 10.1016/j.cclet.2007.01.001

New approach to fabricate nanoporous gold film
摘要:
A simple preparation of ultrathin nanoporous gold film was described. Copper and gold were used to fabricate Cu-Au alloy films through vacuum deposition. The formation of nanoporous gold films from the alloy films involved thermal process and chemical etch by hydrochloric acid or by nitric acid. The free-standing nanoporous gold films have been analyzed by scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray photoelectron spectrometer (XPS) and surface-enhanced Raman scattering (SERS). It was noted that the nanoporous gold film etched by hydrochloric acid is uniform with a cover of fog-like moieties.
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关键词:
- Nanopore
- / Gold film
- / Cu-Au alloy
- / Fog-like metal
- / Chemical etch
English
New approach to fabricate nanoporous gold film
Abstract:
A simple preparation of ultrathin nanoporous gold film was described. Copper and gold were used to fabricate Cu-Au alloy films through vacuum deposition. The formation of nanoporous gold films from the alloy films involved thermal process and chemical etch by hydrochloric acid or by nitric acid. The free-standing nanoporous gold films have been analyzed by scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray photoelectron spectrometer (XPS) and surface-enhanced Raman scattering (SERS). It was noted that the nanoporous gold film etched by hydrochloric acid is uniform with a cover of fog-like moieties.
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Key words:
- Nanopore
- / Gold film
- / Cu-Au alloy
- / Fog-like metal
- / Chemical etch

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