引用本文:
吴瑞阁, 欧阳贱华, 赵新生, 黄小华, 黄惠忠, 吴念祖. 硅表面上构筑具有化学特性的图形的新方法[J]. 物理化学学报,
2001, 17(10): 931-935.
doi:
10.3866/PKU.WHXB20011013
Citation: Wu Rui-Ge, Ouyang Jian-Hua, Zhao Xin-Sheng, Huang Xiao-Hua, Huang Hui-Zhong, Wu Nian-Zu. A New Method to Pattern Silicon Surface with Chemical Functional Groups[J]. Acta Physico-Chimica Sinica, 2001, 17(10): 931-935. doi: 10.3866/PKU.WHXB20011013
Citation: Wu Rui-Ge, Ouyang Jian-Hua, Zhao Xin-Sheng, Huang Xiao-Hua, Huang Hui-Zhong, Wu Nian-Zu. A New Method to Pattern Silicon Surface with Chemical Functional Groups[J]. Acta Physico-Chimica Sinica, 2001, 17(10): 931-935. doi: 10.3866/PKU.WHXB20011013
硅表面上构筑具有化学特性的图形的新方法
摘要:
为了在硅基底上得到不同化学基团修饰的图形，在氢终止硅（111）表面运用光刻技术和光化学反应结合来控制表面成膜反应的位置，并用AFM、XPS、接触角测定等验证了这种方法的可行性.
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关键词:
- 单层膜;分子构筑;光刻;图形;硅表面
English
A New Method to Pattern Silicon Surface with Chemical Functional Groups
Abstract:
Hydrogenterminated silicon surface was found to react with 1alkenes to produce stable monolayers. To pattern such monolayers and create surfaces with regions of different chemical functionalities, we used the combination of the photolithography and the light induced alkylation. The surfaces had been characterized by XPS, AFM, and contact angel measurement. It is shown that this procedure can be used to prepare micropatterns of chemical functional groups on silicon substrate.
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