引用本文:
李浩华, 黎超, 李伟, 李成贤, 葛世慧. 电沉积Co-Cu颗粒膜的巨磁电阻效应[J]. 物理化学学报,
2000, 16(06): 573-576.
doi:
10.3866/PKU.WHXB20000619
Citation: Li Hao-Hua, Li Chao, Li Wei, Li Cheng-Xian, Ge Shi-Hui. Giant Magnetoresistance in Electro-deposited Co-Cu Granular Film[J]. Acta Physico-Chimica Sinica, 2000, 16(06): 573-576. doi: 10.3866/PKU.WHXB20000619
Citation: Li Hao-Hua, Li Chao, Li Wei, Li Cheng-Xian, Ge Shi-Hui. Giant Magnetoresistance in Electro-deposited Co-Cu Granular Film[J]. Acta Physico-Chimica Sinica, 2000, 16(06): 573-576. doi: 10.3866/PKU.WHXB20000619
English
Giant Magnetoresistance in Electro-deposited Co-Cu Granular Film
Abstract:
CoxCu100-x granular films were prepared by electro deposition(ED). The relationship between Co concentration and ED potential, as well as the influence of ED and annealing conditions on GMR have been studied. It is found that the maximum value of GMR depends on the annealing temperature and Co concentration. After annealing Co16Cu84 sample at 425 ℃, we t the maximum value of GMR with -5 %at room temperature, 1100 kA•m-1 and -10% at 77 K, 650 kA•m-1. TEM measurement was used to study the microstructure and the explanation of explain the results.
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Key words:
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Electro-deposition
- / Granular films
- / Giant magnetoresistance(GMR)
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